University of Khartoum

Stability Studies on Cefquinome Sulphate and Niclosamide Using Derivative Spectroscopic and Chromatographic Methods

Stability Studies on Cefquinome Sulphate and Niclosamide Using Derivative Spectroscopic and Chromatographic Methods

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Title: Stability Studies on Cefquinome Sulphate and Niclosamide Using Derivative Spectroscopic and Chromatographic Methods
Author: Shantier, S.W.; Gadkariem, E.A.
Abstract: Stability studies were conducted on cefquinome sulphate and niclosamide to perform chemical and photostability evaluation. Both drugs structures incorporate functional groups liable to chemical and 198 The Sixth Annual Post-graduate Studies & Scientific Research Conference photochemical reactions. First derivative spectrophotometric, high-performance liquid chromato-graphic (HPLC) and thin-layer chromatographic (TLC) methods were developed for the study of the effect of the pH, alkaline and temperature on the degradation of cefquinome sulphate and ni-closamide. Cefquinome sulphate degradation was found to be pH and temperature dependent. The pH-rate profile indicated a first order dependence of Kobs on [OH-] at pHs ranging between 9 and 11. Arrhenius plot obtained at pH 10 was linear between 65° and 100°C. The estimated activation energy of the hydrolysis was found to be 21.1 kcal mol-1. While niclosamide was found to undergo alka¬line hydrolysis with insignificant temperature variation effects, the degradation process was found to resemble the metabolic hydrolytic cleavage of niclosamide to 5-chlorosalicylic acid (fluorescent compound) and 2-chloro-4-nitroaniline (yellow colored product). The pH-rate profile of the alkaline pH- dependent hydrolysis of niclosamide was studied within the pH range 5-7 which indicate a first order dependency of Kobs on [OH-]. In this study, new stability-indicating thin-layer chromatographic methods were also developed for the separation of the drugs and their degradation products in addition to the photochemical stability study that shows the photostability of cefquinome sulphate and photosensitivity of niclosamide
URI: http://khartoumspace.uofk.edu/handle/123456789/19614
Date: 2015


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